High-precision depth profiling of argon and nitrogen ion etching-induced damage in an AlGaAs/GaAs multiple quantum well structure

Author： Otte K.   Frost F.   Schindler A.   Bigl F.   Lippold G.   Gottschalch V.   Flagmeyer R.-H.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.318, Iss.1, 1998-04, pp. : 132-135

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