Co-deposition of cobalt disilicide on silicon-germanium thin films

Author: Goeller P.T.   Nemanich R.J.   Boyanov B.I.   Sayers D.E.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.320, Iss.2, 1998-05, pp. : 206-210

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Abstract