Numerical modelling of the processes of exposure and development in electron beam lithography on high-temperature superconductor thin films

Author： Gueorguiev Y. Vutova K. Mladenov G.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.323, Iss.1, 1998-06, pp. : 222-226

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