Electron microscopic characterization of reactively sputtered ZnO films with different Al-doping levels

Author: Sieber I.   Wanderka N.   Urban I.   Dorfel I.   Schierhorn E.   Fenske F.   Fuhs W.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.330, Iss.2, 1998-09, pp. : 108-113

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Abstract