Particle formation and a-Si:H film deposition in narrow-gap RF plasma CVD

By Maemura Y.   Fujiyama H.   Takagi T.   Hayashi R.   Futako W.   Kondo M.   Matsuda A.  

Thin Solid Films, Vol. 345, Iss. 1, 1999-05 ,pp. : 80-84

Elsevier

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Light induced changes in the defect structure of a-Si:H

By Britton D.T.   Sigcau Z.   Comrie C.M.   Kanguwe D.F.   Minani E.   Knoesen D.   Harting M.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 149-152

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Influence of a-Si:H deposition by catalytic CVD on transparent conducting oxides

By Imamori K.   Masuda A.   Matsumura H.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 147-151

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New feature of the photoconductivity in p-type a-Si:H: independence of photoconductivity of p-type a-Si:H films on doping level and defect concentration

By Kuznetsov S.V.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 261-263

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Chemical gas-phase reactions for a-Si:H and c-Si:H deposition

By Roth A.   Comes F.J.   Beyer W.  

Thin Solid Films, Vol. 293, Iss. 1, 1997-01 ,pp. : 83-86

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