Phase transition and properties of Ti-Al-N thin films prepared by r.f.-plasma assisted magnetron sputtering

Author: Zhou M.   Makino Y.   Nose M.   Nogi K.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.339, Iss.1, 1999-02, pp. : 203-208

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract