Author: Oechsner H. Scheib M. Goebel H.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.341, Iss.1, 1999-03, pp. : 101-104
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Deposition of large area amorphous silicon films by ECR plasma CVD
By Ueda Y. Inoue Y. Shinohara S. Kawai Y.
Vacuum, Vol. 48, Iss. 2, 1997-02 ,pp. :
High-rate deposition of LiNbO 3 films by thermal plasma spray CVD
By Yamaguchi N. Hattori T. Terashima K. Yoshida T.
Thin Solid Films, Vol. 316, Iss. 1, 1998-03 ,pp. :
Cluster-suppressed plasma CVD for deposition of high quality a-Si:H films
By Shiratani M. Koga K. Watanabe Y.
Thin Solid Films, Vol. 427, Iss. 1, 2003-03 ,pp. :