Etch-induced damage in single crystal Si trench etching by planar inductively coupled Cl 2 /N 2 and Cl 2 /HBr plasmas

Author： Lee Y.J.   Hwang S.W.   Yeom G.Y.   Lee J.W.   Lee J.Y.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.341, Iss.1, 1999-03, pp. : 168-171

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