W- and F-doped VO 2 films studied by photoelectron spectrometry

Author： Burkhardt W.   Christmann T.   Meyer B.K.   Niessner W.   Schalch D.   Scharmann A.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.345, Iss.2, 1999-05, pp. : 229-235

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