A ULSI shallow trench isolation process through the integration of multilayered dielectric process and chemical-mechanical planarization

Author： Lin C.-F. Tseng W.-T. Feng M.-S. Wang Y.-L.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.347, Iss.1, 1999-06, pp. : 248-252

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