Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO 2 and SiO 2 films for process control

Author： Vergohl M.   Malkomes N.   Staedler T.   Matthee T.   Richter U.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.351, Iss.1, 1999-08, pp. : 42-47

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