Accurate control of thin film CdS growth process by adjusting the chemical bath deposition parameters

By Guillen C.   Martnez M.A.   Herrero J.  

Thin Solid Films, Vol. 335, Iss. 1, 1998-11 ,pp. : 37-42

Elsevier

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Effect of process parameters on the mechanical properties of carbon nitride thin films synthesized by plasma assisted pulsed laser deposition

By Tabbal M.   Mérel P.   Chaker M.  

Applied Physics A, Vol. 79, Iss. 4-6, 2004-09 ,pp. : 1365-1367

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Multichannel process monitor for real-time film thickness and rate measurements in dry etching and deposition

By Heinrich F.   Heinze D.   Kowalski T.   Hoffmann P.   Kopperschmidt P.  

Vacuum, Vol. 51, Iss. 4, 1998-12 ,pp. : 497-502

Elsevier

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Deposition process study of chromium oxide thin films obtained by d.c. magnetron sputtering

By Contoux G.   Cosset F.   Celerier A.   Machet J.  

Thin Solid Films, Vol. 292, Iss. 1, 1997-01 ,pp. : 75-84

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Deposition process of metal oxide thin films by means of plasma CVD with -diketonates as precursors

By Itoh K.-i.   Matsumoto O.  

Thin Solid Films, Vol. 345, Iss. 1, 1999-05 ,pp. : 29-33

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