![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Author: Thiart J.J. Hlavacek V. Viljoen H.J.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.365, Iss.2, 2000-04, pp. : 275-293
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Combustion chemical vapor deposition
VAKUUM IN FORSCHUNG UND PRAXIS, Vol. 27, Iss. 3, 2015-06 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Chemical vapor deposition of copper-cobalt binary films
By Gu S. Atanasova P. Hampden-Smith M.J. Kodas T.T.
Thin Solid Films, Vol. 340, Iss. 1, 1999-02 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Evaluation of precursors for chemical vapor deposition of ruthenium
By Smith K.C. Sun Y.-M. Mettlach N.R. Hance R.L. White J.M.
Thin Solid Films, Vol. 376, Iss. 1, 2000-11 ,pp. :