Author: Abrams C.F. Graves D.B.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.374, Iss.2, 2000-10, pp. : 150-156
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Atomistic simulation and analysis of plasticity in amorphous silicon§
By Argon A. S.
Philosophical Magazine, Vol. 86, Iss. 25-26, 2006-09 ,pp. :
Atomistic simulation of the [001] surface structure in BaTiO 3
By Heifets E. Dorfman S. Fuks D. Kotomin E.
Thin Solid Films, Vol. 296, Iss. 1, 1997-03 ,pp. :
Real dimensional simulation of anisotropic etching of silicon in CF 4 +O 2 plasma
By Knizikevicius R. Galdikas A. Grigonis A.
Vacuum, Vol. 66, Iss. 1, 2002-06 ,pp. :
Atomistic simulation of SrTiO 3 and BaTiO 3 (110) surface relaxations
Thin Solid Films, Vol. 358, Iss. 1, 2000-01 ,pp. :
Transient 3D/2D simulation of laser-induced ablation of silicon
Applied Physics A, Vol. 92, Iss. 4, 2008-09 ,pp. :