Author: Ruppi S. Larsson A.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.388, Iss.1, 2001-06, pp. : 50-61
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Chemical vapour deposition of Al 2 O 3 on TiO
By Fredriksson E. Carlsson J.-O.
Thin Solid Films, Vol. 263, Iss. 1, 1995-07 ,pp. :
A chemical vapour deposition route to MoO 3 -Bi 2 O 3 thin films
By Barreca D. Rizzi G.A. Tondello E.
Thin Solid Films, Vol. 333, Iss. 1, 1998-11 ,pp. :
Al 2 O 3 formation on Si by catalytic chemical vapor deposition
By Ogita Y.-I. Iehara S. Tomita T.
Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. :
Chemical vapor deposition of Al 2 O 3 films using highly volatile single sources
Thin Solid Films, Vol. 304, Iss. 1, 1997-07 ,pp. :