Reduction of carbon impurities in silicon oxide films prepared by rf plasma-enhanced CVD

Author: Teshima K.   Inoue Y.   Sugimura H.   Takai O.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.390, Iss.1, 2001-06, pp. : 88-92

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Abstract