CVD of hard DLC films in a radio frequency inductively coupled plasma source

Author： Yu S.J.   Ding Z.F.   Xu J.   Zhang J.L.   Ma T.C.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.390, Iss.1, 2001-06, pp. : 98-103

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