Polycrystalline silicon thin films for microsystems: correlation between technological parameters, film structure and electrical properties

Author: Michelutti L.   Chovet A.   Stoemenos J.   Terrot J.-M.   Ionescu M.A.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.401, Iss.1, 2001-12, pp. : 235-242

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Abstract