Study of grain growth of polysilicon formed by nickel-induced-lateral-crystallization of amorphous silicon and subsequent high temperature annealing

Author： Qin M. Poon M.C. Fan L.J. Chan M. Yuen C.Y. Chan W.Y.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.406, Iss.1, 2002-03, pp. : 17-22

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