Effect of deposition rate on structural and electrical properties of Al films deposited on glass by electron beam evaporation

Author: Qiu H.   Wang F.   Wu P.   Pan L.   Li L.   Xiong L.   Tian Y.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.414, Iss.1, 2002-07, pp. : 150-153

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