Study of surface roughening of tensily strained Si 1-x-y Ge x C y films grown by ultra high vacuum-chemical vapor deposition

Author: Calmes C.   Bouchier D.   Debarre D.   Le Thanh V.   Clerc C.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.428, Iss.1, 2003-03, pp. : 150-155

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Abstract