Identification and gas phase kinetics of radical species in Cat-CVD processes of SiH 4

By Nozaki Y.   Kitazoe M.   Horii K.   Umemoto H.   Masuda A.   Matsumura H.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 47-50

Elsevier

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A Cat-CVD Si 3 N 4 film study and its application to the ULSI process

By Uchiyama Y.   Masuda A.   Matsumura H.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 275-279

Elsevier

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Structural properties of a-Si 1-x N x :H films grown by plasma enhanced chemical vapour deposition by SiH 4 + NH 3 + H 2 gas mixtures

By Pirri C.F.   Giorgis F.   Tresso E.  

Thin Solid Films, Vol. 307, Iss. 1, 1997-10 ,pp. : 298-305

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Photoluminescent, wide-bandgap a-SiC:H alloy films deposited by Cat-CVD using acetylene

By Kumbhar A.   Patil S.B.   Kumar S.   Lal R.   Dusane R.O.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 244-248

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Crystallization by excimer laser annealing for a-Si:H films with low hydrogen content prepared by Cat-CVD

By Yogoro Y.   Masuda A.   Matsumura H.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 296-299

Elsevier

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