Effect of r.f. hydrogen plasma annealing on the properties of Si/SiO 2 interface: a spectroscopic ellipsometry study

Author: Paneva A.   Szekeres A.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.433, Iss.1, 2003-06, pp. : 367-370

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Abstract