An oxidation barrier layer for metal-insulator-metal capacitors: ruthenium silicide

Author: Matsui Y.   Nakamura Y.   Shimamoto Y.   Hiratani M.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.437, Iss.1, 2003-08, pp. : 51-56

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Abstract