Author： Bretz K.C. Y.-C. L. Krauss T.D. Wise F.W. Sachse W.H.
Publisher： Elsevier
ISSN： 0041-624X
Source： Ultrasonics, Vol.34, Iss.2, 1996-06, pp. : 513-515
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Access to resources
Recommend
FILTER STRUCTURE FOR SUB-MICRON FILTRATION FABRICATED IN SILICON
Le Journal de Physique Colloques, Vol. 49, Iss. C4, 1988-09 ,pp. :
A SUB-MICRON CMOS PROCESS EMPLOYING TRENCH ISOLATION
Le Journal de Physique Colloques, Vol. 49, Iss. C4, 1988-09 ,pp. :
A COMPARISON OF TRENCH FILLING MATERIALS FOR SUB-MICRON CMOS
Le Journal de Physique Colloques, Vol. 49, Iss. C4, 1988-09 ,pp. :
Short range investigation of sub-micron zirconia particles
Journal of Physics: Conference Series , Vol. 167, Iss. 1, 2009-05 ,pp. :
Access to resources