Profile of Al etch rate estimated from the analysis of 3-D rarefied flow of Cl 2 , BCl 3 , and AlCl 3 in a commercial etcher

Author： Nanbu K.   Serikov V.V.   Kurisawa S.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.47, Iss.6, 1996-06, pp. : 1027-1029

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Chemical vapour deposition of polycrystalline AlN films from AlCl 3 -NH 3 mixtures. - Analysis and modelling of transport phenomena

By Dollet A.   Casaux Y.   Chaix G.   Dupuy C.  

Thin Solid Films, Vol. 406, Iss. 1, 2002-03 ,pp. : 1-16

Elsevier

Access to resources Recommend Favorite

The thermal behaviour of simple aromatic organic compounds with AlCl 3 as additives

By Rashid M.A.   Hossain T.   Asgar M.A.  

Thermochimica Acta, Vol. 259, Iss. 2, 1995-08 ,pp. : 263-268

Elsevier

Access to resources Recommend Favorite

Bi2S3 Bipyramids in Layered Sulfides M2Bi2S3(AlCl4)2 (M = Ag, Cu)

By  

ZAAC-JOURNAL OF INORGANIC AND GENERAL CHEMISTRY (ELECTRONIC), Vol. 641, Iss. 2, 2015-02 ,pp. : 279-284

John Wiley & Sons Inc

Access to resources Recommend Favorite

Replacement of an oxygen atom by chlorine atoms in the reaction of pentafluorobenzaldehyde with CCl3-substituted compounds in the presence of AlCl3

By Petrova T.D.   Platonov V.E.   Pokrovskii L.M.  

Russian Chemical Bulletin, Vol. 51, Iss. 3, 2002-03 ,pp. : 544-546

Springer Publishing Company

Access to resources Recommend Favorite

Effect of Different Ionic Liquids on 5‐Hydroxymethylfurfural Preparation from Glucose in DMA over AlCl3: Experimental and Theoretical Study

By  

CHINESE JOURNAL OF CHEMISTRY (ELECTRONIC), Vol. 33, Iss. 5, 2015-05 ,pp. : 583-588

John Wiley & Sons Inc

Access to resources Recommend Favorite