Application of magnetic neutral loop discharge plasma to SiO 2 etching process

Author: Chen W.   Hayashi T.   Itoh M.   Morikawa Y.   Sugita K.   Uchida T.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.53, Iss.1, 1999-05, pp. : 29-32

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract