A new process for the development of hard and stable sputtered amorphous carbon films

Author： Logothetidis S. Gioti M. Charitidis C. Patsalas P.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.53, Iss.1, 1999-05, pp. : 61-65

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Raman and photoluminescence study of magnetron sputtered amorphous carbon films

By Papadimitriou D. Roupakas G. Xue C. Topalidou A. Panayiotatos Y. Dimitriadis C.A. Logothetidis S.

Thin Solid Films, Vol. 414, Iss. 1, 2002-07 ,pp. : 18-24

Elsevier

Access to resources Recommend Favorite

Pulsed arc deposition of super-hard amorphous carbon films

By Schulz H.

Applied Physics A, Vol. 78, Iss. 5, 2004-03 ,pp. : 675-679

Springer Publishing Company

Access to resources Recommend Favorite

Growth kinetics of sputtered amorphous carbon thin films: composition studies and phenomenological model

By Logothetidis S. Patsalas P. Gioti M. Galdikas A. Pranevicius L.

Thin Solid Films, Vol. 376, Iss. 1, 2000-11 ,pp. : 56-66

Elsevier

Access to resources Recommend Favorite

Influence of different physical factors on microstructure and properties of magnetron sputtered amorphous carbon films

By Shaginyan L.R. Onoprienko A.A. Britun V.F. Smirnov V.P.

Thin Solid Films, Vol. 397, Iss. 1, 2001-10 ,pp. : 288-295

Elsevier

Access to resources Recommend Favorite

Effects of film thickness and contact load on nanotribological properties of sputtered amorphous carbon thin films

By Ma X.-G. Komvopoulos K. Wan D. Bogy D.B. Kim Y.-S.

Wear, Vol. 254, Iss. 10, 2003-07 ,pp. : 1010-1018

Elsevier

Access to resources Recommend Favorite