Monte Carlo simulations of nanometric structures - analysis of micromachined field emitters

Author： Assa'd A.M.D.   El-Gomati M.M.   Dell J.  

Publisher： Elsevier

ISSN： 0304-3991

Source： Ultramicroscopy, Vol.79, Iss.1, 1999-09, pp. : 141-147

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Monte Carlo simulations of coaxial backscattered electrons in SEM

By Rosenberg N.   Jiang C.Z.   Morin P.  

Ultramicroscopy, Vol. 76, Iss. 3, 1999-01 ,pp. : 97-105

Elsevier

Access to resources Recommend Favorite

Comparison between experimental and computer simulations of current-voltage (I-V) characteristics of dielectric-coated photon-stimulated field emitters

By Mayer A.   Mousa  

Ultramicroscopy, Vol. 89, Iss. 1, 2001-10 ,pp. : 95-104

Elsevier

Access to resources Recommend Favorite

Joint Oligogenic Segregation and Linkage Analysis Using Bayesian Markov Chain Monte Carlo Methods

By Wijsman Ellen M.   Yu Dongmei  

Molecular Biotechnology, Vol. 28, Iss. 3, 2004-11 ,pp. : 205-226

Humana Press, Inc

Access to resources Recommend Favorite

The numerical simulation of thermal effects in silicon field emitters

By Huangfu L.   Zhu C.-C.  

Ultramicroscopy, Vol. 79, Iss. 1, 1999-09 ,pp. : 189-194

Elsevier

Access to resources Recommend Favorite

Field emission studies of tungsten-coated silicon-based field emitters

By Chen L.   El-Gomati M.M.  

Ultramicroscopy, Vol. 79, Iss. 1, 1999-09 ,pp. : 135-140

Elsevier

Access to resources Recommend Favorite