Effect of halide ion and applied potential on repassivation behaviour of Al-1 wt.%Si-0.5 wt.%Cu alloy

Author: Su-Il P.   Eung-Jo L.  

Publisher: Elsevier

ISSN: 0013-4686

Source: Electrochimica Acta, Vol.40, Iss.12, 1995-09, pp. : 1963-1970

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Abstract