Etching of n-type silicon in (HF+oxidant) solutions: in situ characterisation of surface chemistry

Author： Safi M.   Chazalviel J.-N.   Cherkaoui M.   Beladi A.   Gorochov O.  

Publisher： Elsevier

ISSN： 0013-4686

Source： Electrochimica Acta, Vol.47, Iss.16, 2002-06, pp. : 2573-2581

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