Preparation of trimethylsilyl group containing copolymer for negative-type photoresists that enable stripped by an alkaline solution

Author： Chiang W.-Y.   Kuo H.-T.  

Publisher： Elsevier

ISSN： 0014-3057

Source： European Polymer Journal, Vol.38, Iss.9, 2002-09, pp. : 1761-1768

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