Atomistic investigation of the Kolmogorov-Johnson-Mehl-Avrami law in electrodeposition process

Author： Berthier F.   Legrand B.   Creuze J.   Tetot R.  

Publisher： Elsevier

ISSN： 0022-0728

Source： Journal of Electroanalytical Chemistry and Interfacial Electrochemistry, Vol.561, Iss.unknown, 2004-01, pp. : 37-52

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