Fatigue of polycrystalline silicon for microelectromechanical system applications: crack growth and stability under resonant loading conditions

Author： Muhlstein C.L. Howe R.T. Ritchie R.O.

Publisher： Elsevier

ISSN： 0167-6636

Source： Mechanics of Materials, Vol.36, Iss.1, 2004-01, pp. : 13-33

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