Growth optimization and doping with Si and Be of high quality GaN on Si(111) by molecular beam epitaxy

Author: Sánchez-García M.   Calleja E.   Sanchez F.   Calle F.   Monroy E.   Basak D.   Muñoz E.   Villar C.   Sanz-Hervas A.   Aguilar M.   Serrano J.   Blanco J.  

Publisher: Springer Publishing Company

ISSN: 1543-186X

Source: Journal of Electronic Materials, Vol.27, Iss.4, 1998-04, pp. : 276-281

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Abstract