Magnetic hexapole lens focusing of a metastable helium atomic beam for UV-free lithography

Author: Chaustowski R.R.   Leung V.Y.F.   Baldwin K.G.H.  

Publisher: Springer Publishing Company

ISSN: 0946-2171

Source: Applied Physics B, Vol.86, Iss.3, 2007-02, pp. : 491-496

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Abstract