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Elsevier

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Taylor & Francis Ltd

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Preparation, fractal surface morphology and photocatalytic properties of TiO 2 films

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Plasmon excitation in vanadium dioxide films

By Niessner W.   Felde B.   Schalch D.   Scharmann A.   Werling M.  

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Surface studies of chemically vapour-deposited silicon films using friction force microscopy

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