INFRARED NANOSECOND LASER ABLATION OF SILICON: THE SPATIAL MULTI-PULSE ENHANCEMENT EFFECT AND ITS DEPENDENCE ON LASER PULSE DURATION - TECHNICAL COMMUNICATION

Author： Gao Yibo   Wu Benxin   Zhou Yun   Tao Sha  

Publisher： Taylor & Francis Ltd

ISSN： 1091-0344

Source： Machining Science and Technology, Vol.13, Iss.3, 2009-07, pp. : 427-436

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