Surface corona discharge-induced plasma chemical process - chemical vapor deposition (SPCP-CVD) as a novel method for surface modification of ceramic membranes

Author: Ida Jun-ichi   Matsuyama Tatsushi   Yamamoto Hideo  

Publisher: VSP

ISSN: 1568-5527

Source: Advanced Powder Technology, Vol.11, Iss.3, 2000-09, pp. : 343-351

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Abstract