Characterization of the Radical Oxidative Level in the Degradation of Phenolic Compounds with H2O2/UV

Author: de Luis A.   Lombraña J.I.   Menéndez A.  

Publisher: Science and Technology Network Inc.

ISSN: 1203-8407

Source: Journal of Advanced Oxidation Technologies, Vol.11, Iss.1, 2008-01, pp. : 21-32

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