Atomistic modelling for boron diffusion in strained silicon substrate

Author: Kim Young-Kyu   Yoon Kwan-Sun   Kim Joong-Sik   Kim Han-Geon   Won Taeyoung  

Publisher: Taylor & Francis Ltd

ISSN: 0892-7022

Source: Molecular Simulation, Vol.34, Iss.1, 2008-01, pp. : 41-45

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Abstract