In Situ Microlithography of Si and GaAs by a Focused Ion Beam in a 200 keV TEM

Author: Furuya Kazuo   Saito Tetsuya   Yamada Isamu   Hata Takao  

Publisher: Oxford University Press

ISSN: 0022-0744

Source: Journal of Electron Microscopy, Vol.45, Iss.4, 1996-08, pp. : 291-297

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Abstract