Recrystallization by annealing in SiC amorphized with Ne irradiation

Author: Aihara J.   Hojou2 K.   Furuno2 S.   Ishihara1 M.   Hayashi1 K.  

Publisher: Oxford University Press

ISSN: 0022-0744

Source: Journal of Electron Microscopy, Vol.51, Iss.2, 2002-04, pp. : 93-98

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Abstract