A Study of the Optical Emission from an rf Plasma during Semiconductor Etching

Author: Harshbarger W. R.   Porter R. A.   Miller T. A.   Norton P.  

Publisher: Society for Applied Spectroscopy

ISSN: 0003-7028

Source: Applied Spectroscopy, Vol.31, Iss.3, 1977-05, pp. : 201-207

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Abstract