Carbon Measurement in Thin Silicon Wafers (∼400 μm) by Infrared Absorption Spectrometry

By Leroueille J.  

Applied Spectroscopy, Vol. 36, Iss. 2, 1982-03 ,pp. : 153-155

Society for Applied Spectroscopy

Access to resources Recommend Favorite

Quantitative Infrared Spectroscopy of Interstitial Oxygen in Silicon Wafers Using Multivariate Calibration

By Linn J. H.   Hanley K. L.  

Applied Spectroscopy, Vol. 47, Iss. 12, 1993-12 ,pp. : 2102-2107

Society for Applied Spectroscopy

Access to resources Recommend Favorite

Low Temperature Evaluation of Carbon and Oxygen Contaminants in Silicon

By Mead D. G.  

Applied Spectroscopy, Vol. 34, Iss. 2, 1980-03 ,pp. : 171-173

Society for Applied Spectroscopy

Access to resources Recommend Favorite

Quantitative Infrared Emission Spectroscopy of Phosphosilicate Glass on Silicon Wafers Using Multivariate Calibration

By Wangmaneerat B.   Mcguire J. A.   Niemczyk T. M.   Haaland D. M.   Linn J. H.  

Applied Spectroscopy, Vol. 46, Iss. 2, 1992-02 ,pp. : 340-344

Society for Applied Spectroscopy

Access to resources Recommend Favorite

Applications of Microstructured Silicon Wafers as Internal Reflection Elements in Attenuated Total Reflection Fourier Transform Infrared Spectroscopy

By Schumacher Henrik   Künzelmann Ulrich   Vasilev Boris   Eichhorn Klaus-Jochen   Bartha Johann W.  

Applied Spectroscopy, Vol. 64, Iss. 9, 2010-09 ,pp. : 1022-1027

Society for Applied Spectroscopy

Access to resources Recommend Favorite