Evaluation of Silicon-Chemiluminescence Monitoring as a Novel Method for Atomic Fluorine Determination and End Point Detection in Plasma Etch Systems

Author： Zijlstra P. A. Beenakker C. I. M.

Publisher： Society for Applied Spectroscopy

ISSN： 0003-7028

Source： Applied Spectroscopy, Vol.35, Iss.4, 1981-07, pp. : 413-418

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