The Application of ICP Spectroscopy to Model the Chemistry Occurring in Plasma-Etch Reactors: Part I

Author: Mautz Karl E.   Parsons Michael L.   Moore Carleton B.  

Publisher: Society for Applied Spectroscopy

ISSN: 0003-7028

Source: Applied Spectroscopy, Vol.43, Iss.8, 1989-11, pp. : 1414-1423

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