Thermal Cure Study of a Low-k Methyl Silsesquioxane for Intermetal Dielectric Application by FT-IR Spectroscopy

Author: Wang C. Y.   Shen Z. X.   Zheng J. Z.  

Publisher: Society for Applied Spectroscopy

ISSN: 0003-7028

Source: Applied Spectroscopy, Vol.54, Iss.2, 2000-02, pp. : 209-213

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