Quantitative Determination of Borophosphosilicate Glass Thin-Film Properties Using Infrared Emission Spectroscopy

By Niemczyk Thomas M.   Zhang Songbiao   Franke James E.   Haaland David M.  

Applied Spectroscopy, Vol. 53, Iss. 7, 1999-07 ,pp. : 822-828

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Quantitative Infrared Emission Spectroscopy of Phosphosilicate Glass on Silicon Wafers Using Multivariate Calibration

By Wangmaneerat B.   Mcguire J. A.   Niemczyk T. M.   Haaland D. M.   Linn J. H.  

Applied Spectroscopy, Vol. 46, Iss. 2, 1992-02 ,pp. : 340-344

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Quantitative Infrared Spectroscopy of Interstitial Oxygen in Silicon Wafers Using Multivariate Calibration

By Linn J. H.   Hanley K. L.  

Applied Spectroscopy, Vol. 47, Iss. 12, 1993-12 ,pp. : 2102-2107

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Elimination of Thin Film Infrared Channel Spectra in Fourier Transform Infrared Spectroscopy

By Hirschfeld T.   Mantz A. W.  

Applied Spectroscopy, Vol. 30, Iss. 5, 1976-09 ,pp. : 552-553

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Noninvasive Polymer Reaction Monitoring by Infrared Emission Spectroscopy with Multivariate Statistical Modeling

By Pell Randy J.   Callis James B.   Kowalski Bruce R.  

Applied Spectroscopy, Vol. 45, Iss. 5, 1991-06 ,pp. : 808-818

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