Use of the Orthogonal Projection Approach (OPA) to Monitor Batch Processes

Author: Gourvénec S.   Lamotte C.   Pestiaux P.   Massart D. L.  

Publisher: Society for Applied Spectroscopy

ISSN: 0003-7028

Source: Applied Spectroscopy, Vol.57, Iss.1, 2003-01, pp. : 80-87

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Abstract